Title : 
Yield enhancement strategies for start-up of a high-volume 8-inch wafer fab
         
        
            Author : 
Lee, Fourmum ; Wang, Ping ; Ceton, Ron ; Goodner, Ray ; Chan, Mike
         
        
            Author_Institution : 
Motorola Inc., Chandler, AZ, USA
         
        
        
        
        
        
            Abstract : 
This paper describes the yield enhancement strategies used in the startup of Motorola´s MOS 12 fab, with the goal of establishing production capability in minimum time. This goal was achieved by implementing process qualification with real time in-line defect monitoring using a well characterized memory product. Wafer inspection and troubleshooting were facilitated by the acquisition of patterned wafer inspection tools employing several different defect detection technologies: pattern analysis, optical pattern filtering, and light scattering. The considerations for equipment startup are discussed, with emphasis on in-line inspection strategy and data analysis tools.
         
        
            Keywords : 
automatic optical inspection; computerised monitoring; data analysis; integrated circuit yield; pattern recognition; production engineering computing; 8 in; Motorola MOS 12; data analysis tools; defect detection technologies; fabrication line startup; high-volume wafer fab; inline inspection strategy; light scattering; optical pattern filtering; pattern analysis; patterned wafer inspection tools; process qualification; production capability; real time inline defect monitoring; troubleshooting; wafer inspection; yield enhancement strategies; Data analysis; Filtering; Inspection; Light scattering; Monitoring; Optical filters; Optical scattering; Pattern analysis; Production; Qualifications;
         
        
        
        
            Conference_Titel : 
Advanced Semiconductor Manufacturing Conference and Workshop, 1995. ASMC 95 Proceedings. IEEE/SEMI 1995
         
        
        
            Print_ISBN : 
0-7803-2713-6
         
        
        
            DOI : 
10.1109/ASMC.1995.484385