DocumentCode :
3224856
Title :
A model for intra industry, supplier, and SEMATECH collaboration including an inter-group effort by industry
Author :
Hossain, S.D. ; Pas, M.F. ; Cleavelin, R. ; Robinson, R. ; Miner, G. ; Nanda, A.
Author_Institution :
Manuf. Sci. & Technol. Center, Texas Instrum. Inc., Dallas, TX, USA
fYear :
1995
fDate :
13-15 Nov 1995
Firstpage :
302
Lastpage :
305
Abstract :
A model is presented for an intra semiconductor user-equipment supplier-SEMATECH project effort. The on-going 0.25 μm Source/Drain Rapid Thermal Process (S/D RTP) project is used as the basis for this model. The successful completion of this project supports the model\´s assertions. A methodological approach taken from the initial stages of a project to the completion generates valuable and valid data, provides a planned strategy, allows for timely allocation of resources, and results in a win-win situation for all involved. This model will be referred to as "Model for Supplier/User Partnering" or MSUP.
Keywords :
integrated circuit manufacture; rapid thermal processing; semiconductor process modelling; SEMATECH; intra industry collaboration; planned strategy; source/drain rapid thermal process; supplier collaboration; supplier/user partnering; win-win situation; Collaboration; Collaborative software; Computer industry; Contamination; Hardware; Manufacturing processes; Pollution measurement; Production; Software tools; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1995. ASMC 95 Proceedings. IEEE/SEMI 1995
ISSN :
1078-8743
Print_ISBN :
0-7803-2713-6
Type :
conf
DOI :
10.1109/ASMC.1995.484392
Filename :
484392
Link To Document :
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