A model for intra industry, supplier, and SEMATECH collaboration including an inter-group effort by industry

Author

Hossain, S.D. ; Pas, M.F. ; Cleavelin, R. ; Robinson, R. ; Miner, G. ; Nanda, A.

Author_Institution

Manuf. Sci. & Technol. Center, Texas Instrum. Inc., Dallas, TX, USA

fYear

1995

fDate

13-15 Nov 1995

Firstpage

302

Lastpage

305

Abstract

A model is presented for an intra semiconductor user-equipment supplier-SEMATECH project effort. The on-going 0.25 μm Source/Drain Rapid Thermal Process (S/D RTP) project is used as the basis for this model. The successful completion of this project supports the model\´s assertions. A methodological approach taken from the initial stages of a project to the completion generates valuable and valid data, provides a planned strategy, allows for timely allocation of resources, and results in a win-win situation for all involved. This model will be referred to as "Model for Supplier/User Partnering" or MSUP.

Keywords

integrated circuit manufacture; rapid thermal processing; semiconductor process modelling; SEMATECH; intra industry collaboration; planned strategy; source/drain rapid thermal process; supplier collaboration; supplier/user partnering; win-win situation; Collaboration; Collaborative software; Computer industry; Contamination; Hardware; Manufacturing processes; Pollution measurement; Production; Software tools; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference and Workshop, 1995. ASMC 95 Proceedings. IEEE/SEMI 1995

ISSN

1078-8743

Print_ISBN

0-7803-2713-6

Type

conf

DOI

10.1109/ASMC.1995.484392

Filename

484392