DocumentCode :
3225070
Title :
EIR pareto as a prioritization tool for factory improvements
Author :
Saha, Sujit ; Yang, Chiang ; Auches, Bruce
Author_Institution :
Intel Corp., Santa Clara, CA, USA
fYear :
1995
fDate :
13-15 Nov 1995
Firstpage :
345
Lastpage :
347
Abstract :
This paper will describe a methodology to prioritize factory indicators using EIR (EDO Improvement Ratio). The purpose of the EIR methodology is to set priorities between and within improvement teams in order to optimize the allocation of limited factory resources (both people and $) without defocusing from the overall factory priority-Maximum number of Good dice. Historically, during a ramp of a factory with a new technology, there are four indicators that compete for the limited resources of the factory: equipment installation, output improvement, line yield and die yield. In the initial phase of the ramp, equipment installation tends to be a priority and as the installations are completed, die yield takes the top priority followed by the other indicators. In a dynamic situation, it is not always easy to set priorities of the different teams (installation, improvement, line yield, die yield) with changing parameters (run rates, defects, utilization, losses) especially when the same resources are shared between multiple indicators.
Keywords :
probability; semiconductor device manufacture; EDO Improvement Ratio; EIR pareto; Equivalent Die Out; die yield; equipment installation; factory improvements; line yield; output improvement; prioritization tool; ramping; semiconductor fab; Educational institutions; Optimization methods; Production facilities; Resource management; Yield estimation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1995. ASMC 95 Proceedings. IEEE/SEMI 1995
ISSN :
1078-8743
Print_ISBN :
0-7803-2713-6
Type :
conf
DOI :
10.1109/ASMC.1995.484402
Filename :
484402
Link To Document :
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