Title :
Active magnetic field canceling system
Author :
Wei-li Sun ; Feng-Chang Chuang ; Yu-Lin Song ; Chwen Yu ; Tzyh-Ghuang Ma ; Tzong-Lin Wu ; Luh-Maan Chang
Author_Institution :
Commun. & Electromagn. Eng., Nat. Taiwan Univ. of Sci. & Technol., Taipei, Taiwan
Abstract :
The extremely low frequency (ELF) magnetic field has significant impact on yield rate especially when the processing reaches less than 14 nanometer in next-generation nano-Fab. For sensitive equipments such as the SEMs, TEMs, STEMs, FIB writers, and E-beam writers, it suggests that the ELF magnetic field should be lower than 0.5 milli-Gauss to guarantee good yield. Therefore, mitigating the magnetic field by active/passive approaches such as the material shielding, wire permutation, and active canceling are highly demanded.
Keywords :
focused ion beam technology; magnetic fields; magnetic shielding; scanning electron microscopy; scanning-transmission electron microscopy; wires (electric); E-beam writers; FIB writers; SEM; STEM; active magnetic field canceling system; active-passive approach; extremely low frequency magnetic field; material shielding; next-generation nanoFab; wire permutation; Coils; Electromagnetic compatibility; Magnetic fields; Magnetic sensors; Power amplifiers; Prototypes; ELF(extremely low frequency); Helmholtz Coil; prototype; sensor;
Conference_Titel :
Electromagnetic Compatibility of Integrated Circuits (EMC Compo), 2013 9th Intl Workshop on
Conference_Location :
Nara
DOI :
10.1109/EMCCompo.2013.6735184
