DocumentCode :
3226039
Title :
Atto-Joule gates for the whole voltage range
Author :
Beiu, Valeriu ; Beg, Azam ; Ibrahim, Walid
Author_Institution :
Dept. of Comput. Eng., United Arab Emirates Univ., Al Ain, United Arab Emirates
fYear :
2011
fDate :
15-18 Aug. 2011
Firstpage :
1424
Lastpage :
1429
Abstract :
Reducing the supply voltage is by far the most widely used low-power technique, as reducing dynamic power quadratically and leakage power linearly, while sacrificing on performances. A similar but less explored route is to reduce and/or limit currents (instead of reducing voltages), e.g., through transistor sizing. This paper details a comparison of a reverse-sized CMOS scheme (which reduces currents), with both a classical CMOS implementation and an ultra low power (ULP) sub-threshold CMOS scheme. Simulation results show that the reverse-sized CMOS inverter performs well over the whole range of supply voltages: (i) it dissipates significantly less than a classical CMOS inverter (20-60×), while it does degrade performances (5-20×) but less than power gaining, i.e., not proportionally; (ii) it is much faster (100-200×) than a ULP inverter, at moderately larger power consumptions (10-40×), but again less than proportional; and (iii) its power-delay-product (PDP) is constantly 5-8× lower than that of the other two inverters considered over the whole range of supply voltages. In particular, a reverse-sized CMOS inverter in 16nm at 300mV has a delay of 9.16ns while breaking the atto-Joule barrier (0.906aJ).
Keywords :
CMOS integrated circuits; invertors; low-power electronics; atto-Joule gates; dynamic power reduction; energy 0.906 aJ; leakage power reduction; low-power technique; power-delay-product; reverse-sized CMOS inverter; size 16 nm; supply voltage; time 9.16 ns; ultra low power sub-threshold CMOS scheme; voltage 300 mV; CMOS integrated circuits; CMOS technology; Delay; Integrated circuit reliability; Inverters; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
Conference_Location :
Portland, OR
ISSN :
1944-9399
Print_ISBN :
978-1-4577-1514-3
Electronic_ISBN :
1944-9399
Type :
conf
DOI :
10.1109/NANO.2011.6144399
Filename :
6144399
Link To Document :
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