DocumentCode :
3226469
Title :
Scaling study of graphene transistors
Author :
Yoon, Youngki ; Nikonov, Dmitri E. ; Salahuddin, Sayeef
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Univ. of California, Berkeley, CA, USA
fYear :
2011
fDate :
15-18 Aug. 2011
Firstpage :
1568
Lastpage :
1571
Abstract :
By performing rigorous self-consistent atomistic quantum transport simulations, scaling behavior of graphene-based MOSFET and TFET are investigated. We show that phonon scattering can negatively affect the on-current and transconductance of a MOSFET significantly, and therefore on-state characteristics can be improved by reducing the channel length down to 30 nm. For a TFET, however, off-state characteristics are very susceptible to phonon scattering, and off-current can increase by 6 orders of magnitude in a 30-nm-channel TFET. In contrast to what is predicted in the ballistic picture, the minimum leakage current and subthreshold swing of a TFET do not monotonically decreased by increasing channel length, but saturate for a channel length longer than 20 nm.
Keywords :
MOSFET; quantum optics; TFET; graphene transistor; graphene-based MOSFET; off-state characteristics; on-current; on-state characteristics; phonon scattering; self-consistent atomistic quantum transport simulation; size 30 nm; transconductance; Leakage current; Logic gates; MOSFET circuits; Phonons; Scattering; Transistors; Tunneling; Graphene; NEGF; Phonon Scattering; Quantum Simulation; Scaling; Transistor;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
Conference_Location :
Portland, OR
ISSN :
1944-9399
Print_ISBN :
978-1-4577-1514-3
Electronic_ISBN :
1944-9399
Type :
conf
DOI :
10.1109/NANO.2011.6144418
Filename :
6144418
Link To Document :
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