Title :
Narrow-width design methodology for operational amplifiers in SOI technology
Author :
Cheung, Denny T Y ; Lau, Jack ; Fung, Samuel K H ; Chan, Philip C.H.
Author_Institution :
Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., Clear Water Bay, Hong Kong
fDate :
30 Sep-3 Oct 1996
Abstract :
Summary form only given. In this paper, a narrow-width methodology (NWM) for designing analog gain stages in SOI technology is presented. By employing NWM, we can, achieve better circuit performance in SOI when compared with bulk CMOS. Given the same testing conditions for both bulk and SOI 2-stage Miller compensated op amp, our study showed a 2X+ speed improvement and a 2X+ reduction of compensation capacitance in SOI. With a judicious choice of transistor sizes, one can also exploit the speed advantages of SOI circuits over bulk in other op amp topologies such as folded-cascode
Keywords :
CMOS analogue integrated circuits; capacitance; integrated circuit design; operational amplifiers; silicon-on-insulator; CMOS op amp design; Miller compensated op amp; SOI technology; Si; analog gain stages; compensation capacitance reduction; narrow-width design methodology; operational amplifier design; speed improvement; Design engineering; Design methodology; Electron devices; Low power electronics; MOSFET circuits; Notice of Violation; Operational amplifiers; Power engineering and energy; Solid state circuits; Voltage;
Conference_Titel :
SOI Conference, 1996. Proceedings., 1996 IEEE International
Conference_Location :
Sanibel Island, FL
Print_ISBN :
0-7803-3315-2
DOI :
10.1109/SOI.1996.552474