• DocumentCode
    3228436
  • Title

    A Gate Dielectric Last Approach to Integrate Organic Based Devices on Plastic Substrates

  • Author

    Gowrisanker, Srinivas ; Ai, Yuming ; Quevedo-Lopez, M.A. ; Jia, Huiping ; Vogel, Eric ; Gnade, Bruce

  • Author_Institution
    Univ. of Texas, Richardson, TX
  • fYear
    2008
  • fDate
    21-24 Jan. 2008
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    In this work we demonstrate a photo-lithographic based process to integrate organic-based devices including rectifiers, ring oscillators, current mirrors, inverters, diodes and capacitors on flexible substrates for RFID and flexible display applications. Our integration method includes a seven mask photolithography process that incorporates several discrete devices built with pentacene as the semiconductor and parylene as the gate dielectric and inter-level dielectric (ILD). The maximum temperature for all processes is 120degC.
  • Keywords
    dielectric materials; flexible electronics; organic semiconductors; photolithography; substrates; RFID; capacitors; current mirrors; diodes; flexible display; flexible substrates; gate dielectric last approach; inter-level dielectric; inverters; mask photolithography process; organic based devices; parylene; pentacene; plastic substrates; rectifiers; ring oscillators; temperature 120 C; Capacitors; Dielectric devices; Dielectric substrates; Inverters; Mirrors; Plastics; Radiofrequency identification; Rectifiers; Ring oscillators; Semiconductor diodes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Flexible Electronics and Displays Conference and Exhibition, 2008
  • Conference_Location
    Phoenix, AZ
  • Print_ISBN
    978-1-4244-2053-7
  • Electronic_ISBN
    978-1-4244-2054-4
  • Type

    conf

  • DOI
    10.1109/FEDC.2008.4483882
  • Filename
    4483882