• DocumentCode
    3228895
  • Title

    Fabrication of stable n-type thin-film transistor with Cs encapsulated single-walled carbon nanotubes

  • Author

    Kato, Toshiaki ; Hatakeyama, Rikizo ; Osanai, Yosuke

  • Author_Institution
    Dept. of Electron. Eng., Tohoku Univ., Sendai, Japan
  • fYear
    2011
  • fDate
    15-18 Aug. 2011
  • Firstpage
    996
  • Lastpage
    999
  • Abstract
    Stable n-type thin film transistors (TFTs) are fabricated with Cs encapsulated single-walled carbon nanotubes (Cs@SWNTs). The transport property of SWNTs-TFTs clearly changes from p- to n-type characteristic after the Cs plasma irradiation. Based on the systematic investigations, it is revealed that there is an optimum ion energy for the effective Cs encapsulation, which is around 50 eV. Furthermore, it is also found that the n-type feature is stable even in water and high temperature (≤ 400 °C) conditions. This very stable n-type TFTs is important for the practical application of SWNTs-based thin film electronics.
  • Keywords
    carbon nanotubes; thin film transistors; Cs encapsulated single-walled carbon nanotube; Cs plasma irradiation; SWNT-based thin film electronics; TFT; n-type characteristic; n-type thin-film transistor; optimum ion energy; p-type characteristic; transport property; Carbon; Carbon nanotubes; Encapsulation; Fabrication; Plasmas; Radiation effects; Thin film transistors; Plasma ion irradiation; Single-walled carbon nanotubes; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
  • Conference_Location
    Portland, OR
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4577-1514-3
  • Electronic_ISBN
    1944-9399
  • Type

    conf

  • DOI
    10.1109/NANO.2011.6144534
  • Filename
    6144534