DocumentCode
3228895
Title
Fabrication of stable n-type thin-film transistor with Cs encapsulated single-walled carbon nanotubes
Author
Kato, Toshiaki ; Hatakeyama, Rikizo ; Osanai, Yosuke
Author_Institution
Dept. of Electron. Eng., Tohoku Univ., Sendai, Japan
fYear
2011
fDate
15-18 Aug. 2011
Firstpage
996
Lastpage
999
Abstract
Stable n-type thin film transistors (TFTs) are fabricated with Cs encapsulated single-walled carbon nanotubes (Cs@SWNTs). The transport property of SWNTs-TFTs clearly changes from p- to n-type characteristic after the Cs plasma irradiation. Based on the systematic investigations, it is revealed that there is an optimum ion energy for the effective Cs encapsulation, which is around 50 eV. Furthermore, it is also found that the n-type feature is stable even in water and high temperature (≤ 400 °C) conditions. This very stable n-type TFTs is important for the practical application of SWNTs-based thin film electronics.
Keywords
carbon nanotubes; thin film transistors; Cs encapsulated single-walled carbon nanotube; Cs plasma irradiation; SWNT-based thin film electronics; TFT; n-type characteristic; n-type thin-film transistor; optimum ion energy; p-type characteristic; transport property; Carbon; Carbon nanotubes; Encapsulation; Fabrication; Plasmas; Radiation effects; Thin film transistors; Plasma ion irradiation; Single-walled carbon nanotubes; Thin film transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
Conference_Location
Portland, OR
ISSN
1944-9399
Print_ISBN
978-1-4577-1514-3
Electronic_ISBN
1944-9399
Type
conf
DOI
10.1109/NANO.2011.6144534
Filename
6144534
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