DocumentCode :
3228895
Title :
Fabrication of stable n-type thin-film transistor with Cs encapsulated single-walled carbon nanotubes
Author :
Kato, Toshiaki ; Hatakeyama, Rikizo ; Osanai, Yosuke
Author_Institution :
Dept. of Electron. Eng., Tohoku Univ., Sendai, Japan
fYear :
2011
fDate :
15-18 Aug. 2011
Firstpage :
996
Lastpage :
999
Abstract :
Stable n-type thin film transistors (TFTs) are fabricated with Cs encapsulated single-walled carbon nanotubes (Cs@SWNTs). The transport property of SWNTs-TFTs clearly changes from p- to n-type characteristic after the Cs plasma irradiation. Based on the systematic investigations, it is revealed that there is an optimum ion energy for the effective Cs encapsulation, which is around 50 eV. Furthermore, it is also found that the n-type feature is stable even in water and high temperature (≤ 400 °C) conditions. This very stable n-type TFTs is important for the practical application of SWNTs-based thin film electronics.
Keywords :
carbon nanotubes; thin film transistors; Cs encapsulated single-walled carbon nanotube; Cs plasma irradiation; SWNT-based thin film electronics; TFT; n-type characteristic; n-type thin-film transistor; optimum ion energy; p-type characteristic; transport property; Carbon; Carbon nanotubes; Encapsulation; Fabrication; Plasmas; Radiation effects; Thin film transistors; Plasma ion irradiation; Single-walled carbon nanotubes; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
Conference_Location :
Portland, OR
ISSN :
1944-9399
Print_ISBN :
978-1-4577-1514-3
Electronic_ISBN :
1944-9399
Type :
conf
DOI :
10.1109/NANO.2011.6144534
Filename :
6144534
Link To Document :
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