Title :
Growth of high quality BiFeO3 thin films by dual ion beam sputtering
Author :
Nakashima, Seiji ; Tsujita, Yosuke ; Seto, Syota ; Fujisawa, Hironori ; Nishioka, Hiroshi ; Kobune, Masafumi ; Shimizu, Masaru ; Park, JungMin ; Kanashima, Takeshi ; Okuyama, Masanori
Author_Institution :
Grad. Sch. of Eng., Univ. of Hyogo, Himeji, Japan
Abstract :
350-nm-thick BiFeO3 (BFO) thin films have been deposited by dual ion beam sputtering on SrRuO3-buffered SrTiO3 (001) substrates of 0° and 0.5° off-cut along [100] at various Bi2O3-side/Fe2O3-side beam current ratio. The BFO thin film on 0.5° off-cut STO substrate deposited at beam current ratio of 20 mA/30 mA show fully saturated D-E hysteresis loops at room temperature. The remanent polarization (2Pr) was 132 μC/cm2. Stripe domain structure was also observed in IP piezoelectric response image. It is considered that the improvement of leakage of BFO on 0.5° off-cut STO substrate is due to reduction of 109° domain walls.
Keywords :
antiferromagnetic materials; bismuth compounds; dielectric hysteresis; dielectric polarisation; electric domain walls; ferroelectric materials; ferroelectric thin films; ferromagnetic materials; ion beam assisted deposition; magnetic domain walls; magnetic hysteresis; magnetic leakage; magnetic thin films; multiferroics; remanence; sputter deposition; Bi2O3-side-Fe2O3-side beam current ratio; BiFeO3; SrRuO3-SrTiO3; SrRuO3-buffered SrTiO3 (001) substrates; dielectric leakage; domain walls; dual ion beam sputtering; ferroelectricity; high quality thin film growth; multiferroic; remanent polarization; saturated D-E hysteresis loops; size 350 nm; stripe domain structure; temperature 293 K to 298 K; Electric fields; Ion beams; Iron; Sputtering; Substrates; Surface morphology; Surface roughness; BiFeO3; dual ion beam sputtering; epitaxial growth; feroelectricity; thin film;
Conference_Titel :
Applications of Ferroelectrics (ISAF/PFM), 2011 International Symposium on and 2011 International Symposium on Piezoresponse Force Microscopy and Nanoscale Phenomena in Polar Materials
Conference_Location :
Vancouver, BC
Print_ISBN :
978-1-4577-1162-6
Electronic_ISBN :
978-1-4577-1161-9
DOI :
10.1109/ISAF.2011.6014140
