Title :
Thermal analysis of 1.3-μm etched-well surface-emitting lasers with dielectric mirrors
Author :
Osinski, Marek ; Nakwaski, Wlodzimierz
Author_Institution :
Center for High Technol. Mater., New Mexico Univ., Albuquerque, NM, USA
fDate :
30 Oct-2 Nov 1995
Abstract :
In this paper, we present the first comprehensive, self-consistent model of dielectric-mirror etched-well surface emitting lasers (DMEWLs) operating at long-wavelengths. The model features a realistic, current-dependent distribution of heat sources and incorporates calculation of lasing threshold, taking into account optical losses due to diffraction, scattering, free-carrier absorption, and intervalence-band absorption
Keywords :
etching; laser mirrors; laser theory; light diffraction; light scattering; optical losses; quantum well lasers; reflectivity; semiconductor device models; surface emitting lasers; thermal analysis; μm etched-well surface-emitting lasers; current-dependent distribution; dielectric mirrors; dielectric-mirror etched-well surface emitting lasers; free-carrier absorption; heat sources; intervalence-band absorption; lasing threshold; light diffraction; light scattering; long-wavelengths; optical losses; self-consistent model; thermal analysis; Absorption; Dielectrics; Etching; Laser theory; Mirrors; Optical scattering; Reflectivity; Surface emitting lasers; Temperature; Vertical cavity surface emitting lasers;
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1995. 8th Annual Meeting Conference Proceedings, Volume 1., IEEE
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-2450-1
DOI :
10.1109/LEOS.1995.484728
