Title :
10th Annual IEEE/SEMI. Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings (Cat. No.99CH36295)
Abstract :
The following topics were dealt with: yield enhancement methodology; productivity and costs; yield modelling; factory dynamics; benchmarking; education; etching; cleaning; defect reduction; photolithography; interconnects; implantation; and process control
Keywords :
electronic engineering education; etching; integrated circuit economics; integrated circuit interconnections; integrated circuit modelling; integrated circuit yield; ion implantation; photolithography; process control; surface cleaning; benchmarking; cleaning; costs; defect reduction; education; etching; factory dynamics; implantation; interconnects; photolithography; process control; productivity; yield enhancement methodology; yield modelling;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1999 IEEE/SEMI
Conference_Location :
Boston, Massachusetts, USA
Print_ISBN :
0-7803-5217-3
DOI :
10.1109/ASMC.1999.798167
