DocumentCode :
3230896
Title :
CMOS friendly MEMS manufacturing process
Author :
Hunter, J. ; Bruner, M. ; Berger, J.
Author_Institution :
Silicon Light Machines, Sunnyvale, CA, USA
fYear :
1998
fDate :
20-24 July 1998
Abstract :
This paper describes a novel approach to manufacturing technology of optical MEMS devices. The devices are manufactured at a local foundry using fully CMOS compatible front-end processes complemented by unique release and seal processing steps. The paper will cover the process flow, technological challenges and process control issues related to this unique approach.
Keywords :
CMOS integrated circuits; electrostatic actuators; light valves; micro-optics; micromachining; optical fabrication; optical projectors; process control; semiconductor device packaging; spatial light modulators; sputter etching; 1D array; CMOS friendly; MEMS manufacturing process; borderless array of pixels; electrically actuated phase grating; fully CMOS compatible front-end process; light modulator; light valve; local foundry; optical MEMS devices; plasma etching; polysilicon; process control issues; process flow; projection displays; release and seal processing steps; technological challenges; CMOS process; CMOS technology; Foundries; Manufacturing processes; Microelectromechanical devices; Micromechanical devices; Optical devices; Paper technology; Pulp manufacturing; Seals;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Broadband Optical Networks and Technologies: An Emerging Reality/Optical MEMS/Smart Pixels/Organic Optics and Optoelectronics. 1998 IEEE/LEOS Summer Topical Meetings
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-4953-9
Type :
conf
DOI :
10.1109/LEOSST.1998.689855
Filename :
689855
Link To Document :
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