Antireflective ‘moth-eye’ structures fabricated by a cheap and versatile process on various optical elements

We present a cheap and versatile method to fabricate antireflective moth-eye structures on various substrates. This method consists of a mask created by a self-assembly technique (block copolymer micelle nanolithography - BCML) and a subsequent reactive ion etching step. Contrary to most other methods this technique also allows for the creation of moth-eye structures on non-flat substrates. We demonstrate the superiority of this technique on a diffraction grating and on different lenses. Electron micrographs show that almost the whole surface area is homogeneously covered with these antireflective nanostructures. Transmittance and reflectance measurements support these findings.