• DocumentCode
    3231581
  • Title

    Symmetry constraint based on mismatch analysis for analog layout in SOI technology

  • Author

    Liu, Jiayi ; Dong, Sheqin ; Hong, Xianlong ; Wang, Yibo ; He, Ou ; Goto, Satoshi

  • Author_Institution
    Tsinghua Univ., Beijing
  • fYear
    2008
  • fDate
    21-24 March 2008
  • Firstpage
    772
  • Lastpage
    775
  • Abstract
    The conventional tools for mismatch elimination such as geometric symmetry and common centroid technology can only eliminate systematic mismatch, but can do little to reduce random mismatch and thermal-induced mismatch. As the development of VLSI technology, the random mismatch is becoming more and more serious. And in the context of Silicon on Insulator (SOI), the self-heating effect leads to unbearable thermal-induced mismatch. Therefore, in this paper, we first propose a new model which can estimate the combination effect of both random mismatch and thermal-induced mismatch by mismatch analysis and SPICE simulation. And in order to meet the different sensitivities of different symmetry pairs, an automatic classification tool and a configurable optimization process are also introduced. All of these are embedded in the floorplanning process. The final experimental results prove the effectiveness of our method.
  • Keywords
    SPICE; VLSI; integrated circuit layout; optimisation; silicon-on-insulator; SOI technology; SPICE simulation; VLSI technology; analog layout; automatic classification; common centroid technology; geometric symmetry; mismatch analysis; mismatch elimination; optimization; silicon on insulator; symmetry constraint; thermal-induced mismatch; Analog circuits; Analytical models; Cities and towns; Electronic design automation and methodology; SPICE; Silicon on insulator technology; Temperature sensors; Thermal conductivity; Thermal factors; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference, 2008. ASPDAC 2008. Asia and South Pacific
  • Conference_Location
    Seoul
  • Print_ISBN
    978-1-4244-1921-0
  • Electronic_ISBN
    978-1-4244-1922-7
  • Type

    conf

  • DOI
    10.1109/ASPDAC.2008.4484055
  • Filename
    4484055