Title :
InGaP/GaAs/InGaAs doped-channel field-effect transistor using camel-like gate structure
Author :
Tsai, Jung-Hui ; Guo, Der-Feng ; Lee, Yuan-Hong ; Dale, Ning-Feng ; Lour, Wen-Shiung
Author_Institution :
Dept. of Electron. Eng., Nat. Kaohsiung Normal Univ., Kaohsiung, Taiwan
Abstract :
In this article, we first fabricate and demonstrate the InGaP/GaAs camel-like gate field-effect transistor with InGaAs pseudomorphic heavy-doped channel. Due to the large gate potential barrier for the use of the n+-GaAs/p+-InGaP/n-GaAs camel-like gate and the thin as well as heavy doping n+-InGaAs channel layer, the effective conduction band discontinuity (ΔEc) is substantially extended and a high gate turn-on voltage up to 2.0 V is obtained. The device exhibits a relatively broad gate voltage swing resulting from the high gate turn-on voltage. In addition, a maximum drain current of 393 mA/mm and a maximum transconductance of 96 mS/mm are measured. These results indicate that the studied device is suitable for signal amplifier and linear circuit applications.
Keywords :
III-V semiconductors; field effect transistors; gallium arsenide; indium compounds; InGaAs pseudomorphic heavy-doped channel; InGaP-GaAs-InGaAs; InGaP/GaAs/InGaAs doped-channel field-effect transistor; camel-like gate structure; effective conduction band discontinuity; gate voltage swing; high gate turn-on voltage; large gate potential barrier; linear circuit application; maximum drain current; maximum transconductance; signal amplifier; Circuits; FETs; Gallium arsenide; HEMTs; Indium gallium arsenide; MODFETs; Ohmic contacts; Schottky barriers; Transconductance; Voltage;
Conference_Titel :
Microwave and Millimeter Wave Technology (ICMMT), 2010 International Conference on
Conference_Location :
Chengdu
Print_ISBN :
978-1-4244-5705-2
DOI :
10.1109/ICMMT.2010.5524949