Title :
Reticle layout to maximize focus and throughput
Author :
Arena, Philip C.
Author_Institution :
Fairchild Semicond., USA
Abstract :
Use of a two reticle (product and test) or a combination reticle (containing test and product on one reticle) strategy in production was considered. The quality of the resultant image (focus placement) and throughput were weighed
Keywords :
focusing; integrated circuit manufacture; photolithography; reticles; IC production; focus placement; reticle layout; semiconductor manufacturing; throughput maximisation; Contacts; Design optimization; Failure analysis; Focusing; Lithography; Manufacturing; Production; Semiconductor device manufacture; Semiconductor device testing; Throughput;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1999 IEEE/SEMI
Conference_Location :
Boston, MA
Print_ISBN :
0-7803-5217-3
DOI :
10.1109/ASMC.1999.798219
