Title :
Cost effective reticle quality management strategies in wafer fabs
Author :
Tomlinson, Wanda ; Samek, Vince ; Shiffler, Barbara ; Gudmundsson, Dadi ; Merritt, Jim ; Nurani, Raman K. ; Shanthikumar, J. George
Author_Institution :
IBM Microelectron., Burlington, VT, USA
Abstract :
A statistically based methodology has been developed to plan and/or optimize the use of reticle inspection capacity in the fab. Statistical methods are used to analyze reticle and product data which are combined, in a stochastic model, with financial parameters. The model uses the combined information to calculate the cost of different reticle inspection strategies, allowing both capacity planning and allocation optimization of given inspection capacity. In this paper we present the reticle inspection planning problem, our solution methodology, excerpts of data analysis performed, and an example inspection planning calculation
Keywords :
cost-benefit analysis; failure analysis; inspection; integrated circuit economics; manufacturing resources planning; quality management; reticles; statistical analysis; allocation optimization; capacity planning; cost effective reticle quality management strategies; data analysis; financial parameters; reticle failure times; reticle inspection capacity; reticle inspection planning problem; statistical methods; statistically based methodology; stochastic model; wafer fabs; Capacity planning; Costs; Data analysis; Frequency; Inspection; Process planning; Quality management; Sampling methods; Statistical analysis; Stochastic processes;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1999 IEEE/SEMI
Conference_Location :
Boston, MA
Print_ISBN :
0-7803-5217-3
DOI :
10.1109/ASMC.1999.798238
