DocumentCode :
3232649
Title :
TCAD as an integral part of the semiconductor manufacturing environment
Author :
Minixhofer, Rainer
Author_Institution :
Austria Microsyst. AG, Unterpremstaetten
fYear :
2006
fDate :
6-8 Sept. 2006
Firstpage :
9
Lastpage :
16
Abstract :
This work shows a new methodology which automates the necessary links between technology computer aided design (TCAD) and the semiconductor manufacturing environment to a high extent. Initially a short overview of a typical chain of processes during the fabrication of an integrated circuit is given. Furthermore an overview on the relations to the respective simulator tools is given. The interfaces between the fabrication process and simulation are identified and the detailed structure of the interfaces is outlined. A comprehensive overview over the interactions in this integrated system is given as well. Finally the strengths of such a structured and integrated approach are demonstrated with a case in a real semiconductor fabrication environment
Keywords :
integrated circuit manufacture; integrated circuit modelling; interface phenomena; semiconductor device manufacture; semiconductor process modelling; technology CAD (electronics); TCAD; integrated circuit fabrication; interface structures; semiconductor manufacturing environment; simulator tools; technology computer aided design; Circuit simulation; Etching; Fabrication; Industrial electronics; Integrated circuit modeling; Integrated circuit technology; Lead compounds; Predictive models; Semiconductor device manufacture; Semiconductor process modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2006 International Conference on
Conference_Location :
Monterey, CA
Print_ISBN :
1-4244-0404-5
Type :
conf
DOI :
10.1109/SISPAD.2006.282827
Filename :
4061570
Link To Document :
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