• DocumentCode
    323284
  • Title

    Development of a micro array type electron multiplier

  • Author

    Kawarabayashi, J. ; Fukuda, D. ; Takahashi, H. ; Iguchi, T. ; Nakazawa, M. ; Takahashi, A. ; Tokue, R. ; Hirata, Y. ; Numazawa, T.

  • Author_Institution
    Dept. of Nucl. Eng., Nagoya Univ., Japan
  • fYear
    1997
  • fDate
    9-15 Nov 1997
  • Firstpage
    791
  • Abstract
    We are currently developing a micro array type electron multiplier which can be used for a two dimensional photomultiplier tube (PMT). This device consists of dynode plates which have many pixels. Keeping its position information, incident electrons are multiplied within each pixel of the array. Since each pixel works as a conventional PMT, this device will be useful for a high counting rate target measurement such as in SR facilities. The micromachining technique was used to fabricate the dynodes of the detector. Slanting hole and pyramid hole structures were investigated as the dynode structure. From the simulation result of these two types, more than 1000 would be obtained as the signal gain factor with 12 dynodes and 200 V/dynode. Based on these results, the pyramid and slanting hole type dynode were fabricated using a silicon technique and a LIGA like process, respectively. From the experimental results, the electron multiplication factor ~2 of the pyramid type dynode was obtained with 2 dynode stages and 150 V/dynode. The signal gain factor 4.6 of the slanting hole dynode was obtained with 2 dynode stages and 400 V/ dynode. These were well agreed with the simulation results
  • Keywords
    electron multiplier detectors; micromachining; photomultipliers; position sensitive particle detectors; 2D photomultiplier tube; LIGA like process; dynode plates; electron multiplication factor; micro array type electron multiplier; micromachining technique; pixel; pyramid hole structures; signal gain factor; slanting hole type dynode; Anisotropic magnetoresistance; Detectors; Electron emission; Electron multipliers; Electron tubes; Etching; Photomultipliers; Silicon; Strontium; Systems engineering and theory;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nuclear Science Symposium, 1997. IEEE
  • Conference_Location
    Albuquerque, NM
  • ISSN
    1082-3654
  • Print_ISBN
    0-7803-4258-5
  • Type

    conf

  • DOI
    10.1109/NSSMIC.1997.672700
  • Filename
    672700