DocumentCode :
3233076
Title :
Polycrystallization of pulsed laser deposited BaTiO3 thin films at room temperature by KrF laser annealing
Author :
Tomita, Hiroyuki ; Ninomiya, Yutaka ; Ito, Atsushi ; Obara, Minoru
Author_Institution :
Dept. of Electr. Eng., Keio Univ., Yokohama, Japan
Volume :
1
fYear :
1995
fDate :
30-31 Oct 1995
Firstpage :
304
Abstract :
It is necessary to establish the fabrication techniques of high quality BaTiO3 thin films. In the present work, the laser annealing technique was applied to crystallize amorphous BaTiO3 thin films deposited by KrTiO3 laser ablation at room temperature, and the effect of pulsed excimer laser annealing on BaTiO 3 thin films was investigated for the first time
Keywords :
barium compounds; excimer lasers; laser beam annealing; optical fabrication; optical films; pulsed laser deposition; BaTiO3; BaTiO3 thin films; KrF; KrF laser annealing; KrTiO3 laser ablation; amorphous BaTiO3 thin films; fabrication techniques; high quality BaTiO3 thin films; laser annealing technique; polycrystallization; pulsed excimer laser annealing; pulsed laser deposited; room temperature; Amorphous materials; Annealing; Crystallization; Laser ablation; Optical device fabrication; Optical pulses; Pulsed laser deposition; Sputtering; Temperature; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1995. 8th Annual Meeting Conference Proceedings, Volume 1., IEEE
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-2450-1
Type :
conf
DOI :
10.1109/LEOS.1995.484881
Filename :
484881
Link To Document :
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