DocumentCode :
3233088
Title :
Nanopatterning and the flexible stamp replication using thermal and roll typed UV-NIL
Author :
Park, Soo Yeon ; Choi, KeeBong ; Kim, GeeHong ; Lee, JaeJong
Author_Institution :
Nano-Mech. Syst. Res. Center, Korea Inst. of Machinery & Mater., Daejeon
fYear :
2008
fDate :
6-9 Jan. 2008
Firstpage :
280
Lastpage :
283
Abstract :
In case of UV-Nanoimprint Lithography, a transparent quartz stamp with nano-scale patterns has the problems that are difficult to fabricate, handle and keep. Also, it´s very expensive to fabricate nano-scale quartz stamp. Furthermore, according to enlarge the substrate size, these problems will be got out of control. In this paper, flexible and transparent replica stamps are fabricated using the polycarbonate, PDMS and polyurethane acryl films by thermal nano-imprint tools (ANT-6T) in order to get over these problems. To verify these stamps, UV nano-imprint lithography process is executed on the roll typed UV-NIL tools (ANT-6R) which is developed by KIMM.
Keywords :
nanolithography; nanopatterning; ultraviolet lithography; ANT-6R; PDMS; flexible stamp replication; nanopatterning; nanoscale patterns; polycarbonate film; polyurethane acryl film; roll typed UV-nanoimprint lithography; thermal UV-nanoimprint lithography; thermal nanoimprint tools; transparent quartz stamp; Control systems; Costs; Engine cylinders; Lithography; Nanolithography; Nanopatterning; Size control; Substrates; Systems engineering and theory; Thermal engineering; PDMS; flexible stamp; polycarbonate; polyurethane; roll typed UV-nanoimprint; thermal nanoimprint;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on
Conference_Location :
Sanya
Print_ISBN :
978-1-4244-1907-4
Electronic_ISBN :
978-1-4244-1908-1
Type :
conf
DOI :
10.1109/NEMS.2008.4484335
Filename :
4484335
Link To Document :
بازگشت