Title :
Subwavelength Optical Elements and Nanoimprint Technology for Optical System on Chip
Author :
Chou, Stephen Y.
Author_Institution :
Princeton Univ., Princeton
Abstract :
In this paper an optical system is integrated on a chip and fabricated monolithically. The two new platform technologies besides guided-wave integrated optics are discussed. Subwavelength optical elements (SOEs), a new class of optical devices well suited for wafer level integration, and nanoimprint technology an enabling nanopatterning method. To fabricate SOEs and harvest their potentials, a ultra-high-resolution large-area nanopatterning with high-throughput and low-cost is essential. Among all available nanopatterning methods, nanoimprint lithography (NIL), demonstrated appears to be one of the most promising technology for SOE fabrication.
Keywords :
integrated optics; integrated optoelectronics; nanolithography; nanopatterning; optical fabrication; optical interconnections; optical waveguides; system-on-chip; wafer-scale integration; guided-wave integrated optics; nanoimprint lithography technology; nanopatterning method; optical devices; optical system on chip; subwavelength optical elements; wafer level integration; High speed optical techniques; Integrated optics; Nanopatterning; Nanoscale devices; Optical devices; Optical diffraction; Optical filters; Optical materials; Optical polarization; System-on-a-chip;
Conference_Titel :
IEEE/LEOS Summer Topical Meetings, 2007 Digest of the
Conference_Location :
Portland, OR
Print_ISBN :
1-4244-0926-8
Electronic_ISBN :
1099-4742
DOI :
10.1109/LEOSST.2007.4288332
