• DocumentCode
    3234346
  • Title

    Parameters extraction for DRIE model

  • Author

    Yunxia Guo ; Yisong Wang ; Guangyi Sun ; Haixia Zhang

  • Author_Institution
    Inst. of Microelectron., Peking Univ., Beijing
  • fYear
    2008
  • fDate
    6-9 Jan. 2008
  • Firstpage
    544
  • Lastpage
    547
  • Abstract
    In this paper, a set of experiments were carried out to extraction the parameters of two-dimensional (2D) Bosch process simulator, DROPIE, from process parameters. These experiments were selected based on the response surface method (RSM). The experimental results were coupled with the DROPIE, and its simulation results agreed with fabrication results very well, in particular the effect of the relative duration of etching vs. deposition and sidewall profile control. This DRIE simulator is a versatile tool to predict and control the DRIE performance based on these input parameters which consistent with the actual process parameters
  • Keywords
    parameter estimation; response surface methodology; sputter etching; Bosch process simulator; DRIE model; DROPIE; deep reactive ion etching; parameter extraction; response surface method; Coils; Etching; Fabrication; Parameter extraction; Plasma applications; Polymers; Predictive models; Response surface methodology; Silicon; Sociotechnical systems;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on
  • Conference_Location
    Sanya
  • Print_ISBN
    978-1-4244-1907-4
  • Type

    conf

  • DOI
    10.1109/NEMS.2008.4484391
  • Filename
    4484391