DocumentCode :
3234346
Title :
Parameters extraction for DRIE model
Author :
Yunxia Guo ; Yisong Wang ; Guangyi Sun ; Haixia Zhang
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing
fYear :
2008
fDate :
6-9 Jan. 2008
Firstpage :
544
Lastpage :
547
Abstract :
In this paper, a set of experiments were carried out to extraction the parameters of two-dimensional (2D) Bosch process simulator, DROPIE, from process parameters. These experiments were selected based on the response surface method (RSM). The experimental results were coupled with the DROPIE, and its simulation results agreed with fabrication results very well, in particular the effect of the relative duration of etching vs. deposition and sidewall profile control. This DRIE simulator is a versatile tool to predict and control the DRIE performance based on these input parameters which consistent with the actual process parameters
Keywords :
parameter estimation; response surface methodology; sputter etching; Bosch process simulator; DRIE model; DROPIE; deep reactive ion etching; parameter extraction; response surface method; Coils; Etching; Fabrication; Parameter extraction; Plasma applications; Polymers; Predictive models; Response surface methodology; Silicon; Sociotechnical systems;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on
Conference_Location :
Sanya
Print_ISBN :
978-1-4244-1907-4
Type :
conf
DOI :
10.1109/NEMS.2008.4484391
Filename :
4484391
Link To Document :
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