Combined nanoimprint and photolithography of integrated polymer optics

We demonstrate wafer-scale fabrication by combined nanoimprint and photolithography (CNP) of integrated polymer optics, combining active and passive polymer components with nm to mm features. Distributed feed-back (DFB) polymer dye lasers are integrated with polymer waveguides. The laser devices are defined in SU-8 resist, doped with Rhodamine 6G laser dye, shaped as planar slab waveguides on a Fused Silica buffer substrate, and with a lst-order DFB surface corrugation forming the laser resonator. When optically pumped at 532 nm, lasing is obtained in the wavelength range 560 nm -600 nm, determined by the grating period. Our results, where 20 laser devices are defined across a 10 cm diameter wafer substrate, demonstrate the feasibility of CNP for wafer-scale fabrication of advanced nano-structured active and passive polymer optical components.