DocumentCode
3234413
Title
Fracture properties of Silicon carbide thin films characterized by bulge test of long membranes
Author
Zhou, Wei ; Yang, Jinling ; Sun, Guosheng ; Liu, Xingfang ; Yang, Fuhua ; Li, Jinmin
Author_Institution
Inst. of Semicond., Chinese Acad. of Sci., Beijing
fYear
2008
fDate
6-9 Jan. 2008
Firstpage
557
Lastpage
560
Abstract
The mechanical properties and fracture behavior of silicon carbide (3C-SiC) thin films grown on silicon substrates were characterized using bulge testing combined with a refined load-deflection model for long rectangular membranes. Plane-strain modulus Eps, prestress s0, and fracture strength smax for 3C-SiC thin films with thickness of 0.40 mum and 1.42 mum were extracted. The Eps values of SiC are strongly dependent on grain orientation. The thicker SiC film presents lower s0 than the thinner film due to stress relaxation. The smax values decrease with increasing film thickness. The statistical analysis of the fracture strength data were achieved by Weibull distribution function and the fracture origins were predicted.
Keywords
Weibull distribution; fracture toughness; membranes; semiconductor thin films; silicon compounds; stress relaxation; wide band gap semiconductors; Si; SiC; Weibull distribution function; bulge testing; fracture strength; grain orientation; mechanical properties; plane-strain modulus; rectangular membranes; refined load-deflection model; silicon carbide thin films; silicon substrates; size 0.40 mum; size 1.42 mum; statistical analysis; stress relaxation; Biomembranes; Load modeling; Mechanical factors; Semiconductor thin films; Silicon carbide; Statistical analysis; Stress; Substrates; Testing; Transistors; Bulge test; Fracture property; Silicon carbide thin films; Weibull distribution function;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on
Conference_Location
Sanya
Print_ISBN
978-1-4244-1907-4
Electronic_ISBN
978-1-4244-1908-1
Type
conf
DOI
10.1109/NEMS.2008.4484394
Filename
4484394
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