Master and slave control of a dual-stage for precision positioning

Master/slave control of a dual-stage for precision positioning with application to IC production is presented. Configuration and work principle of ultra precision positioning stage are pictured. By adopting merits of both coarse and fine stage, a desired motion control system having the capacity of large workspace with high resolution of motion is enabled. Identification method of mechatronics system such as precision positioning stage is described and done based closed-loop control. The automated synthesis procedure of controller is developed using loop shaping techniques. Force decoupling strategy is introduced under the consideration of reality in practice. The simulation and experiment results show that the positioning precision achieves to 10 nanometers using dual stage.