Title :
A novel electromagnetically actuated resonant MEMS scanning mirror with large deflection
Author :
Mu, Canjun ; Zhang, Feiling ; Lu, Liang ; Wu, Yaming
Author_Institution :
Shanghai Inst. of Microsyst. & Inf. Technol., Chinese Acad. of Sci., Shanghai
Abstract :
This work presents a novel electromagnetically actuated microelectromechanical systems (MEMS) scanning mirror with large deflection for optical scanning applications. This optical scanning mirror with large size of 6times4 mm2 has been implemented using bulk etching micromachining process, and electroplating technique. Moreover, the electromagnetical actuator with moving coils is employed to realize the large deflection combining with a strongly magnetic field. The whole wafer with the thickness of 310 mum is exploited to increase the stiffness of mirror and reduce the deformations of mirror due to thermal strain. After measuring it, the maximum optical deflection angle of our optical scanner is plusmn15deg at lower power consumption of 708 muW, the resonant frequency associated with the torsional mode is 838 Hz with a quality factor of 214 in air. Additionally, this MEMS scanning mirror as a precise optics element presents good surface flatness, roughness and high reflectivity, so our MEMS optical scanning mirror is suitable to being applied in some scanning systems such as high speed micro-spectrometer and optical tunable filter in optical communication.
Keywords :
electroplating; micromechanical devices; mirrors; optical communication; optical scanners; MEMS optical scanning mirror; MEMS scanning mirror; bulk etching micromachining; electromagnetical actuator; electromagnetically actuated resonant MEMS; electroplating technique; frequency 838 Hz; large deflection; magnetic field; microelectromechanical systems; optical communication; optical deflection angle; power 708 muW; thermal strain; Etching; High speed optical techniques; Magnetic field induced strain; Magnetic field measurement; Microelectromechanical systems; Micromachining; Micromechanical devices; Mirrors; Optical filters; Resonance; MEMS scanning mirror; amplitude-frequency response; bulk silicon micromachining process; electromagnetic actuation; electroplating technique; surface flatness;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on
Conference_Location :
Sanya
Print_ISBN :
978-1-4244-1907-4
Electronic_ISBN :
978-1-4244-1908-1
DOI :
10.1109/NEMS.2008.4484404
