Title :
Diamond micro and nano resonators using laser, capacitive or piezoresistive detection
Author :
Lu, Jing ; Cao, Zongliang ; Aslam, DeanM ; Sepulveda, Nelson ; Sullivan, John P.
Author_Institution :
Michigan State Univ., East Lansing, MI
Abstract :
Design, fabrication and testing of polycrystalline diamond (poly-C) micro and nano resonators are reported using laser, capacitive or piezoresistive detection. Important diamond MEMS fabrication issues, including micro-masking in dry etching, are also addressed. The resonators consisted of undoped poly-C (grown at 700degC or 780degC) cantilever beams with lengths, widths and thicknesses in the ranges of 40 - 2000 mum, 10 - 200 mum and 0.6 - 2 mum, respectively. The ploy-C piezoresistors, in-situ boron doped (p = 1 - 10 Omega*cm) at 700degC, had lengths, widths and thickness in the ranges of 24 - 42 mum, 3-12 mum and 0.5 mum, respectively. The early results of measurement using piezoelectric actuation and laser detection, in a vacuum chamber held at 10 s torr, are very encouraging.
Keywords :
etching; micromechanical resonators; nanotechnology; piezoresistance; capacitive detection; diamond MEMS fabrication; dry etching; laser detection; micromasking; nanoresonator; piezoresistive detection; polycrystalline diamond microresonator; Boron; Etching; Hydrogen; Impedance; Microcavities; Optical device fabrication; Piezoresistance; Resonance; Resonant frequency; Testing; RFMEMS; capacitive and piezoresistive detection; laser; micro and nano resonators; polycrystalline diamond;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on
Conference_Location :
Sanya
Print_ISBN :
978-1-4244-1907-4
Electronic_ISBN :
978-1-4244-1908-1
DOI :
10.1109/NEMS.2008.4484462