DocumentCode :
3235787
Title :
A new approach to analyze a sub-micron CMOS inverter
Author :
Pattanaik, Manisha ; Banerjee, Swapna
Author_Institution :
Dept. of Electron. & Electr. Commun. Eng., Indian Inst. of Technol., Kharagpur, India
fYear :
2003
fDate :
4-8 Jan. 2003
Firstpage :
116
Lastpage :
121
Abstract :
An analytical model is proposed for submicron CMOS devices based on Thornber´s scaling law where the field dependent mobility and carrier velocity saturation are treated independently. Comparison of simulated results with the experimental results of I∼V data for sub and deep sub micrometer MOSFETs down to 0.09 μm effective gate length demonstrates the accuracy of the model. A sub micron CMOS (0.2 μm technology) inverter is analyzed by using the proposed model. Results show that the calculated propagation delay and output voltage waveform are in good agreement with Spectre simulation results.
Keywords :
CMOS logic circuits; MOSFET; carrier mobility; circuit simulation; integrated circuit modelling; logic gates; semiconductor device models; 0.09 micron; 0.2 micron; CMOS inverter; I/V characteristics; MOSFET; Thornber scaling law; carrier velocity saturation; effective gate length; field dependent mobility; output voltage waveform; propagation delay; Analytical models; CMOS logic circuits; CMOS technology; Circuit simulation; Degradation; Inverters; MOSFETs; Particle scattering; Propagation delay; Semiconductor device modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Design, 2003. Proceedings. 16th International Conference on
ISSN :
1063-9667
Print_ISBN :
0-7695-1868-0
Type :
conf
DOI :
10.1109/ICVD.2003.1183124
Filename :
1183124
Link To Document :
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