• DocumentCode
    3236250
  • Title

    On the design and fabrication of metal molds in LIGA

  • Author

    Guo, Yuhua ; Tian, Yangchao ; Du, R.

  • Author_Institution
    Inst. of Precision Eng., Chinese Univ. of Hong Kong, Hong Kong
  • fYear
    2008
  • fDate
    6-9 Jan. 2008
  • Firstpage
    990
  • Lastpage
    995
  • Abstract
    Most previous research on electroplating in LIGA has been focused on electrodeposition of metal into high aspect ratio resist cavities. The process in which the metal grows up crossing the top of resist cavities has been largely neglected. In this process, various defects may occur. A typical defect is the hole- formation at the top of electroplated metal mold, especially when the space/linewidth ratio of a microstructure is large. In order to understand and hence, to eliminate these problems, the electroplating process is investigated in details in this paper. First, the current density distribution is investigated using an electroplating simulation tool. The simulation results show that it is almost an isotropic growing model at the first stage of the process. As the deposited metal grows the space between electrodes is shortened and the current density distribution between the electrodes will be modulated and hence, will not be isotropic any more. The simulation also shows that a trench will form and its aspect ratio can reach a considerable magnitude especially when the space/linewidth ratio of the mold is large. As a result, ion depletion may become significant causing the deposition being stopped and thus forming holes at the bottom of overlapped neighbor electrodes. In order to solve this problem, an auxiliary electrode is introduced. The experiment results show the holes are therefore effectively eliminated in a nickel mold. This work also provides some design suggestions for the LIGA parts with various space / linewidth ratios.
  • Keywords
    LIGA; electroplating; LIGA; current density distribution; electrodeposition; electroplating; metal molds; Current density; Electrodes; Embossing; Fabrication; Laboratories; Lithography; Microstructure; Nickel; Resists; Synchrotron radiation; LIGA;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on
  • Conference_Location
    Sanya
  • Print_ISBN
    978-1-4244-1907-4
  • Electronic_ISBN
    978-1-4244-1908-1
  • Type

    conf

  • DOI
    10.1109/NEMS.2008.4484488
  • Filename
    4484488