DocumentCode :
3236694
Title :
Study of GaAs nanowire electronic devices by using Monte Carlo method
Author :
Shen, Ying ; Guo, Hang
Author_Institution :
Pen-Tung Sah MEMS Res. Center, Xiamen Univ., Xiamen
fYear :
2008
fDate :
6-9 Jan. 2008
Firstpage :
1108
Lastpage :
1112
Abstract :
In this paper, we study electrical properties and performance of GaAs nanowire electronic devices by using Monte Carlo method. Instead of quasi 1-D or 1-D configurations, the GaAs nanowire is regarded as 2-D configurations in our study and 2-D Monte Carlo method is developed, in which the surface roughness scattering is taken into consideration to study the size or scale effect on carrier mobility in the GaAs nanowire electronic devices, and furthermore, Try and Error method is integrated into the code to obtain their DC performance. The GaAs nanowire MOSFET, inverter and NOR gate are designed and studied, and results are presented in the paper. For GaAs nanowire MOSFET, carrier mobility in its channel would decline 40% when the diameter of the nanowire changes from 100nm to 20nm; for GaAs noanwire inverter, its I-V characteristics for different channel lengths is analyzed and logic function is proved; for GaAs nanowire NOR gate, its logic output switching characteristic is obtained as well.
Keywords :
III-V semiconductors; MOSFET; Monte Carlo methods; electronic engineering computing; gallium arsenide; invertors; logic gates; nanowires; surface roughness; 2D Monte Carlo method; DC performance; GaAs; GaAs nanowire electronic devices; MOSFET; NOR gate; carrier mobility; inverters; surface roughness scattering; try and error method; Acoustic scattering; Electrons; Gallium arsenide; MOSFET circuits; Monte Carlo methods; Nanoscale devices; Optical scattering; Phonons; Rough surfaces; Surface roughness; 2-D Monte Carlo method; GaAs nanwire electronic devcies; Try and Error method; carrier mobiltiy; surface roughness scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2008. NEMS 2008. 3rd IEEE International Conference on
Conference_Location :
Sanya
Print_ISBN :
978-1-4244-1907-4
Electronic_ISBN :
978-1-4244-1908-1
Type :
conf
DOI :
10.1109/NEMS.2008.4484512
Filename :
4484512
Link To Document :
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