Title :
Recent trends in yield management system
Author_Institution :
A&E Technol. Center, NEC Corp., Kawasaki, Japan
Abstract :
Failure analysis plays a very important role in the early introduction and fast yield improvement of new generation LSIs. Novel failure analysis technologies have been developed including an expert-system-based memory cell failure cause identification system, MEMOFANEX. These predicted causes are statistically related to the particle or pattern defects monitored at each wafer processing step using the software, MEMOLINK, which can lead to a very effective suggestion of which processing step accounts for the low yield problem. In addition, a novel technology named MEMOFAN has successfully isolated many peripheral circuitry failure locations. For logic LSIs a technology is developed to trace LSI´s fault path back to the location of the defect using an electron beam voltage image. With this technique, about 800 logic LSI´s have been successfully analyzed, resulting in successful debugging and yield improvement. This paper first makes brief reviews of enhancement technologies, then reviews the recent trends in yield management systems, and finally reports on our systems, putting an emphasis on failure analysis technologies
Keywords :
expert systems; failure analysis; fault diagnosis; integrated circuit yield; integrated memory circuits; large scale integration; logic testing; MEMOFAN; MEMOFANEX; MEMOLINK; debugging; electron beam voltage image; expert-system-based memory cell failure cause; failure analysis; fault path; new generation LSI; pattern defects; peripheral circuitry failure locations; wafer processing step; yield management system; Condition monitoring; Etching; Image sampling; Light scattering; Optical films; Optical scattering; Optical sensors; Particle scattering; Shape; Throughput;
Conference_Titel :
Statistical Metrology, 1997 2nd International Workshop on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-3737-9
DOI :
10.1109/IWSTM.1997.629400