Title :
Modeling mixed-mode DC and RF stress in SiGe HBT power amplifiers
Author :
Cheng, Peng ; Grens, Curtis M. ; Appaswamy, Aravind ; Chakraborty, Partha S. ; Cressler, John D.
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Tech, Atlanta, GA
Abstract :
The degradation of SiGe HBTs due to mixed-mode DC and RF stress (simultaneous application of high current and voltage) has been modeled for the first time. State-of-the-art 200 GHz SiGe HBTs were first characterized, and then DC and RF stressed. Using TCAD simulations and calculations based upon a reaction-diffusion model, the excess base current due to stress was modeled as a function of the stress current and voltage. This physics-based stress model was then designed as a sub-circuit in Cadence, and incorporated into a cascode SiGe PA design to predict the DC and RF stress-induced excess base current. Predicted degradation is in agreement with RF stress results.
Keywords :
Ge-Si alloys; elemental semiconductors; heterojunction bipolar transistors; power amplifiers; technology CAD (electronics); HBT power amplifiers; SiGe; TCAD simulations; mixed-mode DC and RF stress; Degradation; Germanium silicon alloys; Heterojunction bipolar transistors; Power amplifiers; Predictive models; Radio frequency; Radiofrequency amplifiers; Silicon germanium; Stress; Voltage;
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting, 2008. BCTM 2008. IEEE
Conference_Location :
Monteray, CA
Print_ISBN :
978-1-4244-2725-3
Electronic_ISBN :
1088-9299
DOI :
10.1109/BIPOL.2008.4662730