DocumentCode :
3237583
Title :
Electrical characteristics of a novel gate structure 4H-SiC power static induction transistor
Author :
Iwasaki, T. ; Oono, T. ; Asano, K. ; Sugawara, Y. ; Yatsuo, T.
Author_Institution :
Tech. Res. Center, Hitachi Ltd., Ibaraki, Japan
fYear :
1997
fDate :
26-29 May 1997
Firstpage :
149
Lastpage :
152
Abstract :
A power SIT with a novel gate structure was conceived, in which high blocking gain and low on-state voltage have been simultaneously achieved and the characteristics of silicon carbide (SiC) have been effectively employed. Simulation studies on characteristics of the SIT have been conducted. When a forward bias that was less than the built-in voltage was applied to the gate, the on-state voltage dropped to 0.25 V (at 200 A/cm2) and the gate reverse voltage required for blocking was 10 V for a SIT with a withstand voltage of 700 V. The on-state voltage dropped to 3.1 V (at 100 A/cm2) and the gate reverse bias required for blocking was 80 V for a SIT with a withstand voltage of 5,000 V
Keywords :
characteristics measurement; power field effect transistors; semiconductor materials; silicon compounds; static induction transistors; 0.25 V; 10 V; 3.1 V; 5 kV; 80 V; SiC; blocking gain; forward bias; gate reverse bias; gate reverse voltage; gate structure; on-state voltage; power static induction transistor; withstand voltage; Avalanche breakdown; Electric variables; Epitaxial growth; Insulation; Laboratories; Low voltage; MOSFETs; Schottky barriers; Schottky diodes; Silicon carbide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and IC's, 1997. ISPSD '97., 1997 IEEE International Symposium on
Conference_Location :
Weimar
ISSN :
1063-6854
Print_ISBN :
0-7803-3993-2
Type :
conf
DOI :
10.1109/ISPSD.1997.601457
Filename :
601457
Link To Document :
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