• DocumentCode
    3238181
  • Title

    A low-voltage, low-power microwave SOI MOSFET

  • Author

    Colinge, J.P. ; Chen, J. ; Flandre, D. ; Raskin, J.P. ; Gillon, R. ; Vanhoenacker, D.

  • Author_Institution
    Microelectron. Lab., Univ. Catholique de Louvain, Belgium
  • fYear
    1996
  • fDate
    30 Sep-3 Oct 1996
  • Firstpage
    128
  • Lastpage
    129
  • Abstract
    Summary form only given. Recently, it has been demonstrated that the use of high-resistivity SOI (SIMOX) substrates (5,000 and 10,000 Ω.cm) yields MOSFETs which offer interesting microwave performances. Indeed unity-gain frequencies (fT) of 14 and 23.6 GHz and maximum oscillation frequencies (fmax) of 21 and 32 GHz have been reported for effective gate lengths of 0.36 and 0.25 μm, respectively, and using supply voltages ranging from 3 to 5 volts. Such devices can be integrated with planar lines to implement MMIC circuits. These transistors were fabricated using a dedicated MOS process, called MICROXTM, which uses non-standard CMOS features, such as a metal (gold) gate and air-bridge metallisation. In this work, the high-frequency performances of microwave transistors fabricated using a standard fully-depleted SOI CMOS process are described. These devices are, therefore, compatible with analog and digital circuits fabricated using the same low-cost process
  • Keywords
    MOSFET; field effect MMIC; microwave field effect transistors; silicon-on-insulator; 0.25 micron; 0.36 micron; 10000 ohmcm; 14 to 32 GHz; 3 to 5 V; 5000 ohmcm; Au air-bridge metallisation; Au gate metallisation; Au-Si; MICROX; MMIC circuits; SIMOX substrates; dedicated MOS process; fully-depleted SOI CMOS process; low-cost process; low-power MOSFET; low-voltage MOSFET; maximum oscillation frequencies; microwave SOI MOSFET; microwave performance; microwave transistors; unity-gain frequencies; CMOS process; Digital circuits; Frequency; Gold; MMICs; MOSFET circuits; Metallization; Microwave devices; Microwave transistors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 1996. Proceedings., 1996 IEEE International
  • Conference_Location
    Sanibel Island, FL
  • ISSN
    1078-621X
  • Print_ISBN
    0-7803-3315-2
  • Type

    conf

  • DOI
    10.1109/SOI.1996.552527
  • Filename
    552527