DocumentCode
3238181
Title
A low-voltage, low-power microwave SOI MOSFET
Author
Colinge, J.P. ; Chen, J. ; Flandre, D. ; Raskin, J.P. ; Gillon, R. ; Vanhoenacker, D.
Author_Institution
Microelectron. Lab., Univ. Catholique de Louvain, Belgium
fYear
1996
fDate
30 Sep-3 Oct 1996
Firstpage
128
Lastpage
129
Abstract
Summary form only given. Recently, it has been demonstrated that the use of high-resistivity SOI (SIMOX) substrates (5,000 and 10,000 Ω.cm) yields MOSFETs which offer interesting microwave performances. Indeed unity-gain frequencies (fT) of 14 and 23.6 GHz and maximum oscillation frequencies (fmax) of 21 and 32 GHz have been reported for effective gate lengths of 0.36 and 0.25 μm, respectively, and using supply voltages ranging from 3 to 5 volts. Such devices can be integrated with planar lines to implement MMIC circuits. These transistors were fabricated using a dedicated MOS process, called MICROXTM, which uses non-standard CMOS features, such as a metal (gold) gate and air-bridge metallisation. In this work, the high-frequency performances of microwave transistors fabricated using a standard fully-depleted SOI CMOS process are described. These devices are, therefore, compatible with analog and digital circuits fabricated using the same low-cost process
Keywords
MOSFET; field effect MMIC; microwave field effect transistors; silicon-on-insulator; 0.25 micron; 0.36 micron; 10000 ohmcm; 14 to 32 GHz; 3 to 5 V; 5000 ohmcm; Au air-bridge metallisation; Au gate metallisation; Au-Si; MICROX; MMIC circuits; SIMOX substrates; dedicated MOS process; fully-depleted SOI CMOS process; low-cost process; low-power MOSFET; low-voltage MOSFET; maximum oscillation frequencies; microwave SOI MOSFET; microwave performance; microwave transistors; unity-gain frequencies; CMOS process; Digital circuits; Frequency; Gold; MMICs; MOSFET circuits; Metallization; Microwave devices; Microwave transistors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, 1996. Proceedings., 1996 IEEE International
Conference_Location
Sanibel Island, FL
ISSN
1078-621X
Print_ISBN
0-7803-3315-2
Type
conf
DOI
10.1109/SOI.1996.552527
Filename
552527
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