Title :
Discrimination of clustered defects on wafers using statistical methods
Author :
Ikota, Mash ; Taguchi, Junichi ; Sugimoto, Aritoshi ; Sato, Hisako ; Masuda, Hiroo
Author_Institution :
Device Dev. Center, Hitachi Ltd., Tokyo, Japan
Abstract :
This paper presents a method for discrimination of clustered defects. The histogram of the number of defects per die is approximated to several major distributions. As a result, we found that Poisson distribution is almost equivalent to real data. The advantage of this method is that accurate coordinates are not required. Therefore it can be applied for almost all tools regardless of their accuracy of coordinates
Keywords :
Poisson distribution; integrated circuit yield; statistical process control; IC yield; Poisson distribution; SPC; coordinate accuracy; discrimination; process monitoring; statistical methods; wafer clustered defects; Clustering algorithms; Distribution functions; Exponential distribution; Fabrication; Hardware; Histograms; Inspection; Monitoring; Process control; Statistical analysis;
Conference_Titel :
Statistical Metrology, 1997 2nd International Workshop on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-3737-9
DOI :
10.1109/IWSTM.1997.629412
