• DocumentCode
    3239149
  • Title

    Electromagnetic compatibility in semiconductor manufacturing

  • Author

    Montoya, Julian A.

  • fYear
    1995
  • fDate
    10-12 Oct. 1995
  • Firstpage
    162
  • Abstract
    Electromagnetic Interference (EMI) causes problems in semiconductor manufacturing facilities that range from trivial nuisances to major disruptions of production. In many instances, these issues are addressed in a reactionary rather than proactive manner by individuals who do not have the experience or the equipment necessary to combat EMI problems in a timely, cost effective manner. This approach leads to expensive retrofits, reduced equipment availability, long recovery times, and in some cases, line yield impacts. The goal of electromagnetic compatibility (EMC) in semiconductor manufacturing is to ensure that semiconductor process, metrology, and support equipment operate as intended without being affected by electromagnetic disturbances, either transmitted through air (radiated interference), or transferred into the equipment via a conductive media (conducted interference). Rather than being neglected until serious issues arise, EMC should be considered in the early stages of facility design, in order to gain the most benefit at the lowest cost
  • Keywords
    Costs; Electromagnetic compatibility; Electromagnetic compatibility and interference; Electromagnetic interference; Electromagnetic radiation; Electromagnetic radiative interference; Manufacturing processes; Metrology; Production facilities; Semiconductor device manufacture;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Northcon 95. I EEE Technical Applications Conference and Workshops Northcon95
  • Conference_Location
    Portland, OR, USA
  • Print_ISBN
    0-7803-2639-3
  • Type

    conf

  • DOI
    10.1109/NORTHC.1995.485066
  • Filename
    485066