DocumentCode :
3241420
Title :
Fatigue life enhancement of low silver content Sn-Ag-Cu flip-chip interconnects by Ni addition
Author :
Kariya, Yoshibaru ; Hosoi, Takuya ; Kimura, Takashi ; Terashima, Shinichi ; Tanaka, Masamoto ; Suga, Tadatomo
Author_Institution :
Nat. Inst. for Mater. Sci., Tsukuba, Japan
Volume :
2
fYear :
2004
fDate :
1-4 June 2004
Firstpage :
103
Abstract :
The mechanical shear fatigue test has been performed to investigate the fatigue properties of Sn-1.2 mass%Ag-0.5 mass%Cu-0.05 mass%Ni for flip chip interconnections. The low cycle fatigue endurance of the alloy is almost equivalent to that of Sn-3 mass%Ag-0.5 mass%Cu alloy, even though the fatigue endurance of Sn-1 mass%Ag-0.5 mass%Cu alloy was poorer than that of the 3 mass%Ag alloy. Adding Ni to low silver content Sn-Ag-Cu alloy leaded to fine microstructure, and the microstructure had a network structure of Ag3Sn intermetallic compound together with fine Cu-Sn intermetallic compound. The microstructure resulted in high strain hardening exponents, which leaded to good low cycle fatigue endurance of the alloy.
Keywords :
alloying additions; copper alloys; crystal microstructure; failure analysis; fatigue; fatigue testing; flip-chip devices; integrated circuit interconnections; integrated circuit testing; nickel alloys; silver alloys; tin alloys; work hardening; Ni addition; SnAgCu flip-chip interconnects; SnAgCuNi; fatigue endurance; fatigue life enhancement; fatigue properties; fine CuSn intermetallic compound; fine microstructure; shear fatigue test; strain hardening; Fatigue; Flip chip; Intermetallic; Lead; Mechanical factors; Microstructure; Nickel alloys; Performance evaluation; Silver; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermal and Thermomechanical Phenomena in Electronic Systems, 2004. ITHERM '04. The Ninth Intersociety Conference on
Print_ISBN :
0-7803-8357-5
Type :
conf
DOI :
10.1109/ITHERM.2004.1318264
Filename :
1318264
Link To Document :
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