Title :
2001 6th International Workshop on Statistical Methodology (Cat. No.01TH8550)
Abstract :
The influence of defects and process fluctuations upon VLSI yield is becoming increasingly crucial. Hence, statistical methodology is important for defect analysis and bridging between design and manufacturing. Treats robust designs for process and device, and applications of design-of-experiments (DOE). Session 2 deals with defect related yield and productivity control such as E-T data analysis. Session 3 addresses variability of circuits and interconnect
Keywords :
VLSI; integrated circuit design; integrated circuit testing; integrated circuit yield; process control; statistical analysis; E-T data analysis; VLSI yield; circuit variability; defect analysis; defect related yield; design-of-experiments; process fluctuations; productivity control; robust designs; statistical methodology;
Conference_Titel :
Statistical Methodology, IEEE International Workshop on, 2001 6yh.
Conference_Location :
Kyoto, Japan
Print_ISBN :
0-7803-6688-3
DOI :
10.1109/IWSTM.2001.933814
