Title : 
3.3 kV punchthrough IGBT with low loss and fast switching
         
        
            Author : 
Mori, M. ; Kobayashi, H. ; Saiki, T. ; Nagasu, M. ; Sakano, J. ; Saitou, R.
         
        
            Author_Institution : 
Res. Lab., Hitachi Ltd., Ibaraki, Japan
         
        
        
        
        
        
            Abstract : 
This paper presents a new punchthrough (PT) IGBT with a high blocking voltage of 3.3 kV. We numerically show that a high injection efficiency with a p+layer and local lifetime control in an n-layer are more effective in reducing the turn-on and turn-off losses, respectively. A p+epitaxial layer at the collector has been made in order to realize a high injection efficiency, which greatly reduced the turn-on loss, experimentally. When a local lifetime control technique is applied to this new PT IGBT, the turn-off loss is decreased by approximately 50% compared to a conventional PT IGBT with uniform lifetime control of electron irradiation. The new PT IGBT provides fast switching with rise and fall times of about 1 μs at 125°C. In addition, in this PT IGBT it is easy to apply a high resistivity n-layer without increasing its thickness or losing high blocking voltage in comparison with non-punchthrough (NPT) IGBT, which can get low failure rate (FIT) with cosmic ray
         
        
            Keywords : 
characteristics measurement; insulated gate bipolar transistors; losses; power transistors; semiconductor device models; 1 mus; 125 degC; 3.3 kV; blocking voltage; high resistivity n-layer; injection efficiency; local lifetime control; local lifetime control technique; punchthrough IGBT; switching times; turn-off losses; turn-on losses; Conductivity; Electrons; Epitaxial layers; Insulated gate bipolar transistors; Inverters; Laboratories; Motor drives; Power supplies; Rail transportation; Voltage;
         
        
        
        
            Conference_Titel : 
Power Semiconductor Devices and IC's, 1997. ISPSD '97., 1997 IEEE International Symposium on
         
        
            Conference_Location : 
Weimar
         
        
        
            Print_ISBN : 
0-7803-3993-2
         
        
        
            DOI : 
10.1109/ISPSD.1997.601479