DocumentCode
3243762
Title
Nanoscale simulation of heat conduction in semiconductor devices
Author
Sinha, Sanjiv ; Schelling, P.K. ; Phillpot, S.R. ; Goodson, K.E.
Author_Institution
Dept. of Mech. Eng., Stanford Univ., CA, USA
Volume
2
fYear
2004
fDate
1-4 June 2004
Firstpage
734
Abstract
Localized heat generation, with dimensions of the order of 10 nm, takes place in the drain regions of current transistors, resulting in an increase in thermal resistance near such a hotspot. We present a model based on the phonon Boltzmann transport equation (BTE) that agrees well with data for hotspots in simple geometries. The model suggests that scattering rates of optical phonons are key to the conduction physics. We use molecular dynamics to obtain phonon relaxation rates and show their dependence on the energy density in the hotspot. This work improves the constitutive modeling of heat flow in nanoscale devices.
Keywords
Boltzmann equation; elemental semiconductors; molecular dynamics method; phonon spectra; semiconductor device models; semiconductor thin films; silicon; thermal resistance; thin film transistors; constitutive modeling; drain region; energy density; heat conduction; heat flow; hotspot; localized heat generation; molecular dynamics; nanoscale devices; nanoscale simulation; optical phonon scattering rate; phonon Boltzmann transport equation; phonon relaxation rate; semiconductor devices; thermal resistance; transistors; Acoustic scattering; Immune system; Nanoscale devices; Optical attenuators; Optical films; Optical scattering; Phonons; Semiconductor devices; Silicon; Thermal resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Thermal and Thermomechanical Phenomena in Electronic Systems, 2004. ITHERM '04. The Ninth Intersociety Conference on
Print_ISBN
0-7803-8357-5
Type
conf
DOI
10.1109/ITHERM.2004.1318381
Filename
1318381
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