Title :
A Designer´s Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node [Tutorial]
Author :
Liebmann, Lars ; Torres, J. Andres
Author_Institution :
Int. Bus. Machines, Hopewell Junction, NY, USA
Abstract :
Device scaling with manufacturing methods that overcome the inherent limits of optical lithography is a constant focus of the microelectronics industry. The authors of this tutorial article review the state-of-the-art and major challenges of subresolution lithography, and discuss modern double-patterning lithography solutions and supporting EDA tools to surpass them.
Keywords :
electronic design automation; nanolithography; nanopatterning; photolithography; EDA tools; device scaling; double-patterning lithography; manufacturing methods; microelectronics industry; optical lithography; size 14 nm; subresolution lithography; Density measurement; Design methodology; Llithography; Microelectronics; Scaling; Tutorials; Ultraviolet sources;
Journal_Title :
Design & Test, IEEE
DOI :
10.1109/MDAT.2013.2255911
