• DocumentCode
    3247
  • Title

    A Designer´s Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node [Tutorial]

  • Author

    Liebmann, Lars ; Torres, J. Andres

  • Author_Institution
    Int. Bus. Machines, Hopewell Junction, NY, USA
  • Volume
    30
  • Issue
    3
  • fYear
    2013
  • fDate
    Jun-13
  • Firstpage
    70
  • Lastpage
    92
  • Abstract
    Device scaling with manufacturing methods that overcome the inherent limits of optical lithography is a constant focus of the microelectronics industry. The authors of this tutorial article review the state-of-the-art and major challenges of subresolution lithography, and discuss modern double-patterning lithography solutions and supporting EDA tools to surpass them.
  • Keywords
    electronic design automation; nanolithography; nanopatterning; photolithography; EDA tools; device scaling; double-patterning lithography; manufacturing methods; microelectronics industry; optical lithography; size 14 nm; subresolution lithography; Density measurement; Design methodology; Llithography; Microelectronics; Scaling; Tutorials; Ultraviolet sources;
  • fLanguage
    English
  • Journal_Title
    Design & Test, IEEE
  • Publisher
    ieee
  • ISSN
    2168-2356
  • Type

    jour

  • DOI
    10.1109/MDAT.2013.2255911
  • Filename
    6491444
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3247