Title :
Managing fab UHP N2 by measuring trace moisture
Author :
Barth, Douglas C. ; Bolkenius, Marion ; Wagner, Matthew L. ; Cloarec, Jean-Luc
Author_Institution :
Strategic Marketing, Pall Microelectron., Timonium, MD, USA
Abstract :
TO MANAGE, YOU MUST MEASURE. In order to manage a fab´s ultrahigh purity (UHP) bulk N2 gas supply, one must be able to measure its purity. In this study, Air Liquide used a new MEMS-based trace moisture analyzer from Pall, the Gaskleen® Pico1000 analyzer, to measure the moisture concentration in the bulk UHP N2 supplied to two European semiconductor fabs. Moisture quality was confirmed at both fabs as being below 1 ppbv. The design of the gas sampling system (GSS) used to transport the N2 to the analyzer was found to be critical for achieving accurate measurement. The Pico1000 analyzer was demonstrated to be accurate, robust, easy to use, and mobile.
Keywords :
microsensors; moisture measurement; nitrogen; semiconductor device manufacture; Air Liquide; European semiconductor fabs; GSS; Gaskleen Pico1000 analyzer; MEMS-based trace moisture analyzer; N2; Pall; UHP bulk nitrogen gas supply; fab ultrahigh purity bulk nitrogen gas supply; gas sampling system; moisture concentration; moisture quality; Instruments; Micromechanical devices; Moisture; Moisture measurement; Pollution measurement; Regulators; Semiconductor device measurement;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2015 26th Annual SEMI
Conference_Location :
Saratoga Springs, NY
DOI :
10.1109/ASMC.2015.7164466
