DocumentCode
3247454
Title
Blowback filtration for CVD vacuum pump protection
Author
Ruth, Jochen ; Wagner, Matthew L. ; Heser, Gerd
Author_Institution
Pall Microelectron., SLS Global Tech Support, Dreieich, Germany
fYear
2015
fDate
3-6 May 2015
Firstpage
136
Lastpage
140
Abstract
Pall Microelectronics has used blowback filtration to protect a CVD vacuum installation at an European semiconductor fab. In cyclic regenerating blowback filtration, a powder cake builds up on the filter element and is periodically removed by gas blowback. In this application, the filter successfully removed SiOx particles formed in the foreleg of the pump. The reliability of the system is mainly dependent on the valves. They must repeatedly operate under harsh process conditions.
Keywords
chemical vapour deposition; filtration; vacuum pumps; CVD vacuum pump protection; cyclic regenerating blowback filtration; gas blowback; powder cake; Filtration; Maintenance engineering; Media; Optical filters; Silicon; Solids; Valves;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference (ASMC), 2015 26th Annual SEMI
Conference_Location
Saratoga Springs, NY
Type
conf
DOI
10.1109/ASMC.2015.7164484
Filename
7164484
Link To Document