Coupled hydrodynamic and electrodynamic modelling of an transformer coupled plasma (TCP) for semiconductor processing

Author

Scheubert, P. ; Awakowicz, Peter ; Schwefel, R. ; Wachutka, G.

Author_Institution

Inst. for Phys. of Electrotechnol., Tech. Univ. Munchen, Germany

fYear

1999

fDate

1999

Firstpage

191

Lastpage

194

Abstract

A planar transformer coupled plasma source (TCP) as used for semiconductor processing was characterised theoretically and experimentally. In this paper the homogeneity of the plasma in dependence of process pressure and coil configurations was investigated. Simulations for noble gas discharges in a wide pressure range were compared with theoretical data from a reactor model. A 2D-fluid plasma model coupled self-consistently with an electrodynamic model was used to calculate the theoretical results. Experiment and simulation show very good agreement for a wide range of parameters

Keywords

Poisson equation; plasma CVD; plasma collision processes; plasma density; plasma materials processing; plasma radiofrequency heating; plasma simulation; semiconductor process modelling; sputter etching; 2D-fluid plasma model; Langmuir probe measurements; Poisson equation; balance equations; coil configurations; electrodynamic model; electron density profiles; hydrodynamic model; noble gas discharges; planar transformer coupled plasma source; plasma CVD; plasma collisions; plasma etching; plasma heating; plasma homogeneity; process pressure; reactor model; self-consistently coupled; semiconductor processing; simulations; wide pressure range; Coils; Electrodynamics; Electrons; Hydrodynamics; Plasma applications; Plasma density; Plasma materials processing; Plasma measurements; Plasma sources; Semiconductor process modeling;

fLanguage

English

Publisher

ieee

Conference_Titel

Simulation of Semiconductor Processes and Devices, 1999. SISPAD '99. 1999 International Conference on

Conference_Location

Kyoto

Print_ISBN

4-930813-98-0

Type

conf

DOI

10.1109/SISPAD.1999.799293

Filename

799293