Title : 
Precise physical modeling of the reverse-short-channel effect for circuit simulation
         
        
            Author : 
Suetake, M. ; Miura-Mattausch, M. ; Mattausch, H.J. ; Kumashiro, S. ; Shigyo, N. ; Odanaka, S. ; Nakayama, N.
         
        
            Author_Institution : 
Dept. of Electr. Eng., Hiroshima Univ., Japan
         
        
        
        
        
        
            Abstract : 
A physical based threshold voltage model for circuit simulation is developed. The conventional short-channel effect as well as the reverse-short-channel effect are included. The reverse-short-channel effect due to impurity pileup at the surface of the substrate is modeled by assuming a linear impurity profile as a function of depth. Measured threshold voltage dependence on the bulk voltage is used to determine the impurity profile. The physically based modeling of the reverse-short-channel effect enabled a short-channel effect description, which simply exploits the channel length dependence of the lateral electric field
         
        
            Keywords : 
MOSFET; circuit simulation; impurity distribution; semiconductor device models; channel length dependence; circuit simulation; impurity pileup; lateral electric field; linear impurity profile; nMOSFET; physical model; reverse-short-channel effect; short-channel effect; substrate surface; threshold voltage model; Circuit simulation; Extrapolation; MOSFET circuits; Semiconductor impurities; Substrates; Threshold voltage; Voltage measurement;
         
        
        
        
            Conference_Titel : 
Simulation of Semiconductor Processes and Devices, 1999. SISPAD '99. 1999 International Conference on
         
        
            Conference_Location : 
Kyoto
         
        
            Print_ISBN : 
4-930813-98-0
         
        
        
            DOI : 
10.1109/SISPAD.1999.799297