Title :
Porous silicon field emission cathode development
Author :
Jessing, J.R. ; Parker, D.L. ; Weichold, M.H.
Author_Institution :
Dept. of Electr. Eng., Texas A&M Univ., College Station, TX, USA
fDate :
July 30 1995-Aug. 3 1995
Abstract :
This paper will address the development of a porous silicon cathode technology which shows promise in solving the existing problems, specifically the unstable, low current density, non-reproducible and high voltage emission, encountered by other cathode technologies. Monolithic two- and three-terminal devices have been designed, manufactured, and characterized. All of these devices have resulted in stable, reproducible operating characteristics that follow the Fowler-Nordheim model. Vacuum transport of the electrons and temperature independence (to 250/spl deg/C) of the I-V characteristics have been confirmed. Appreciable emission current has been observed with macroscopic fields on the order of 10/sup 4/ V/cm, thus indicating a large submicroscopic field enhancement due to the geometrical nature of the porous silicon.
Keywords :
cathodes; current density; electron field emission; elemental semiconductors; porous materials; silicon; vacuum microelectronics; 250 degC; Fowler-Nordheim model; I-V characteristics; Si; current density; emission current; field emission cathode development; porous cathode technology; reproducible operating characteristics; submicroscopic field enhancement; three-terminal devices; two-terminal devices; Anodes; Cathodes; Current density; Diodes; Fabrication; Low voltage; Manufacturing; Microstructure; Silicon; Solid state circuits;
Conference_Titel :
Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
Conference_Location :
Portland, OR, USA
Print_ISBN :
0-7803-2143-X
DOI :
10.1109/IVMC.1995.486984