Optical Properties and Elemental Composition of Ta2O5 Thin Films

Author

Guo Peitao ; Xue Yiyu ; Huang Caihua ; Xia Zhilin ; Zhang Guangyong ; Fu Zhiwei

Author_Institution

Sch. of Automobile Eng., Wuhan Univ. of Technol., Wuhan, China

fYear

2009

fDate

14-16 Aug. 2009

Firstpage

1

Lastpage

4

Abstract

The optical properties of tantalum oxide thin films fabricated by electron beam evaporation with ion assisted have been investigated. The as-deposited thin films are of good transmittance, of which the maxima is about 93%, close to that of the bare substrate; the refractive indexes are found to increase with the substrate temperature. The elemental composition and chemical bonding state in the as-deposited thin film has also been probed by X-ray photoelectron spectroscopy (XPS). The XPS results reveal that the main composition of the as-deposited film is mainly Ta₂O₅ with some TaO_x and a little TaO, the O/Ta ratio is about 2.69 which is a bit higher than the stoichiometry of Ta₂O₅.

Keywords

X-ray photoelectron spectra; bonds (chemical); electron beam deposition; ion beam assisted deposition; refractive index; stoichiometry; tantalum compounds; thin films; vacuum deposition; Ta₂O₅; X-ray photoelectron spectroscopy; XPS; chemical bonding state; electron beam evaporation; elemental composition; ion assisted technology; optical properties; refractive index; stoichiometry; substrate temperature; tantalum oxide thin film fabrication; transmittance; Electron beams; Electron optics; Optical films; Optical refraction; Optical variables control; Particle beam optics; Refractive index; Substrates; Temperature; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Photonics and Optoelectronics, 2009. SOPO 2009. Symposium on

Conference_Location

Wuhan

Print_ISBN

978-1-4244-4412-0

Type

conf

DOI

10.1109/SOPO.2009.5230101

Filename

5230101