• DocumentCode
    3250819
  • Title

    Modeling of thermal effects in silicon field emitters

  • Author

    Ancona, M.G.

  • Author_Institution
    Naval Res. Lab., Washington, DC, USA
  • fYear
    1995
  • fDate
    July 30 1995-Aug. 3 1995
  • Firstpage
    61
  • Lastpage
    65
  • Abstract
    Thermal effects in silicon field emitters are analyzed and an attempt is made to identify "intrinsic" phenomena that can occur under normal operating conditions and that might trigger catastrophic breakdown. For this analysis an approximate quasi-equilibrium treatment is employed which is presumably most accurate at low current levels. Unlike for metal field emitters where Nottingham heating dominates, for silicon field emitters it is found that the heating is predominantly ohmic in origin except at very low currents. The temperatures produced by this heating are much larger than those in metals for a given current and geometry. And although the calculations indicate that for typical designs these temperatures are still small enough so as not to represent a direct reliability threat, their size coupled with their sensitivity to changes in current-ohmic heating increases as the square of the current-suggests caution both in design and in trusting the results of this relatively crude analysis. With respect to the former, designs for which the heat-sinking is weak, e.g., atomically-sharp tips or tips on high aspect-ratio poses, may be susceptible to thermal failure. Similarly, additional ohmic heating due to ac currents can push a design into thermal jeopardy. Finally, it is found that increasing the doping does not appear to lessen the ohmic heating significantly (because of band-bending and scattering effects) nor does the Nottingham effect, which under some circumstances seems to actually provide cooling, appear sufficient to offset the ohmic effects.
  • Keywords
    electron field emission; elemental semiconductors; failure analysis; semiconductor device models; semiconductor device reliability; silicon; vacuum microelectronics; Nottingham effect; Si; band bending; catastrophic breakdown; doping; heat sinking; ohmic heating; quasi-equilibrium model; reliability; scattering; silicon field emitters; thermal effects; thermal failure; Electric breakdown; Electron emission; Geometry; Heat sinks; Heating; Laboratories; Physics; Silicon; Temperature sensors; Thermal conductivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
  • Conference_Location
    Portland, OR, USA
  • Print_ISBN
    0-7803-2143-X
  • Type

    conf

  • DOI
    10.1109/IVMC.1995.486990
  • Filename
    486990